Surface Analysis

Scanning Electron Microscopy:

JEOL6460LV

  • JEOL JSM-6460 LV with Energy Dispersive Spectroscopy
  • 50X-50,000X magnification
  • Tungsten filament
  • Variable pressure vacuum system (5×10^-6 to 2.0 Torr)
  • Three segment solid state backscattered electron detector
    • Composition mode imaging
    • Topography mode imaging
    • Shadow mode imaging
  • Large specimen chamber with 5-axis motorized stage

 

Scanning Electron Microscopy with TopCon SM-300

TopCon SM-300 Scanning Electron Microscope

  • Tungsten filament scanning electron microscope
  • Energy Dispersive Spectroscopy (EDS) detector
  • 50X-10,000X magnification
  • X-Y-Z stage with rotation
  • Elemental analysis down to carbon (measures top 1-4microns of surface)
  • EDS line scan and mapping capabilities

 


 

X-ray Photoelectron Spectroscopy:

Perkin Elemer PHI 5440 ESCA System

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  • Mg anode
  • Ar ion gun for sample surface cleaning and depth profiling
  • Surface elemental (>Li) and chemical analysis (top 1-2nm of solids), thin films and powders

 

 

Hewlett Packard 5950 A ESCA Spectrometer

  • Monochromatic Al anode source
  • Surface elemental (>Li) and chemical analysis (top 1-2nm of solids), thin films and powders
  • Argon sputtering for surface cleaning and depth profiling (0-50nm)

 

Atomic Force Microscopy:

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Agilent 5420 AFM

  • Surface topography (dry or in liquids)
  • Z-resolution <1nm (range sub nm to 2micrometers)
  • Maximum 50micron x 50 micron lateral scan window
  • Contact mode
  • intermittent contact (tapping) mode
  • Force modulation microscopy (FMM)
  • Lateral force microscopy (LFM)
  • Current sensing mode (CSAFM)
  • Magnetic force microscopy (MFM)

 

3-D Laser Confocal Microscopy:

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Olympus LEXT OLS4100

  • Laser scanning non-contact microscope for 3D imaging
  • 405nm semiconductor laser with photomultiplier detector
  • Total magnification: 108x – 2,000x
  • Polarizing plate
  • 100mm x 100mm motorized stage
  • Surface feature observation at 20nm resolution
  • Image stitching capability for high resolution over wide lateral area